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Lithography_scheduling_problem_instances

This repository contains problem instances for the unrelated parallel machine scheduling problem, including machine and sequence dependent setup times, eligibility constraints, two auxiliary resources per job (a pod and a reticle) and trasnfer times for the auxiliary resources.

The problem instances found hereare used in two different papers.

  1. Scheduling a Real-World Photolithography Area with Constraint Programming by Patrick Deenen, Wim Nuijten and Alp Akcay. The problem instances used in this paper can be found in folders:
  • small_instances
  • 10_real_world_instances
  1. Optimizing production control in the photolithography area of a semiconductor manufacturing facility by Patrick Deenen, Rick Adriaensen, Alp Akcay, Wim Nuijten and Ivo Adan. The problem instances used in this paper can be found in 5 real-world problem instances.
  • 5_real_world_instances

Further explanation on the problem instances can be found on on: https://github.com/paatrickd/Lithography_scheduling_problem_instances/wiki/Explanation-on-problem-instances.

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